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German Lithotalk Forum
Suited Photoresists
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Suited Photoresists
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AZ 5214 and Humidity
2
kjetland
383
Tue 09 Mar, 2010 03:37
Guest
high transparent photoresist
3
zhangshenfu
842
Wed 19 Aug, 2009 07:41
Guest
AZ 5214E exposure time
1
guest1
1277
Tue 03 Jun, 2008 16:17
guest
AZ 5214 E Sidewall profile on metal surface
1
Raj
1193
Wed 14 May, 2008 07:02
Guest
Process parameters for 20-25um AZ nLOF2070
0
Christian
970
Tue 08 Apr, 2008 15:50
Christian
Lift off using AZ5214E as insulating layer
1
NewPhDStudent
1808
Mon 25 Feb, 2008 10:13
Guest
Image Reversal Baking in oven
1
Guest
1096
Fri 11 Jan, 2008 06:59
Guest
Best resist for 100um cu plating?
1
Newcomer
1570
Thu 05 Oct, 2006 11:01
Administrator
AZ 5214
1
Amir Z
2404
Tue 06 Jun, 2006 17:19
Guest
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Suited Photoresists
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Photoresist Processing
----------------
Specific Resists or Polymers
Storage and Handling of Photoresists
Substrate Pretreatment
Adhesion Promotion
Resist Coating
Softbake (Prebake)
Rehydration
Exposure
Post Exposure Bake
Development
Hardbake
Unspecific
Dry Etching
----------------
Deformation or Bubbling of the Fotoresist Mask
Resist Erosion
Resist Removal After Etching
Silicon Dry Etching
Dry etching of Other Materials
Wet Etching
----------------
General
Aluminium
Chrome
Copper
Glass / Quartz / SiO
2
Gold
Nickel
Silicon
SiN
X
Titanium
Other Materials
Lift-Off
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Suited Photoresists
Coating
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