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Specific Resists or Polymers
Storage and Handling of Photoresists
Substrate Pretreatment
Adhesion Promotion
Resist Coating
Softbake (Prebake)
Rehydration
Exposure
Post Exposure Bake
Development
Hardbake
Unspecific
Deformation or Bubbling of the Fotoresist Mask
Resist Erosion
Resist Removal After Etching
Silicon Dry Etching
Dry etching of Other Materials
General
Aluminium
Chrome
Copper
Glass / Quartz / SiO
2
Gold
Nickel
Silicon
SiN
X
Titanium
Other Materials
Suited Photoresists
Coating
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Photoresist Processing
Dry Etching
Wet Etching
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Photoresist Processing
----------------
Specific Resists or Polymers
Storage and Handling of Photoresists
Substrate Pretreatment
Adhesion Promotion
Resist Coating
Softbake (Prebake)
Rehydration
Exposure
Post Exposure Bake
Development
Hardbake
Unspecific
Dry Etching
----------------
Deformation or Bubbling of the Fotoresist Mask
Resist Erosion
Resist Removal After Etching
Silicon Dry Etching
Dry etching of Other Materials
Wet Etching
----------------
General
Aluminium
Chrome
Copper
Glass / Quartz / SiO
2
Gold
Nickel
Silicon
SiN
X
Titanium
Other Materials
Lift-Off
----------------
Suited Photoresists
Coating
Lift-Off
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